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High power impulse

    HiPIMS設(shè)備:高能脈沖弧PVD設(shè)備及脈沖復(fù)合PVD設(shè)備

High power impulse :

Feature: 

1.High power ion source achieving uniformed, larger ion deposition distribution over a larger area at high ion current density.  

2.Mixed sputtering of different metals, alloys and oxides 

3.Film layers are uniform

4.Automatic controlling system

5.Highly anti-corrsion capability

HiPIMS設(shè)備:高能脈沖弧PVD設(shè)備及脈沖復(fù)合PVD設(shè)備

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