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HiPIMS is the abbreviation of high power pulse Magnetron sputtering sputtering, which is a Magnetron sputtering technology that uses high pulse peak power and low pulse duty ratio to generate high sputtering metal ionization rate.

HiPIMS-400A is a vacuum deposition power supply created by New Platinum Technology, which is suitable for the needs of coating experiments in colleges and universities. It can output DC+pulse combination, has high pulse peak current, high ionization rate, high discharge density, high particle energy, and good reactivity. It can be used as an upgrade alternative to the DC Magnetron sputtering power supply, and can be used in the existing magnetron system without modification. High power pulse Magnetron sputtering is the first choice in the hard coating process of corrosion resistance and wear resistance.

Product features:

Multiple waveform settings, with reverse arc suppression ability, and a more delicate film layer.

Especially suitable for multi waveform settings of innovative PVD processes in universities.

It can be remotely monitored and controlled by mobile phones, adjust various parameters, remotely turn off the power, and monitor the operation of the power supply.

The screen is fully synchronized, and the command feedback is fast and accurate. Walking and eating are both controllable and convenient, and even going to the restroom during the experiment will be more leisurely.